Reactive Ion Etch : The RIE equipment is used for selective etching of different materials, by the action of a plasma containing ionized atoms, this dry etch occurs in a gaseous state.
The photograph below shows both equipment, equivalent in appearance, and on top the electronic control part associated with each equipment. Thin films deposit and selective etch services of different materials can be provided.

Manufacturer: Roth & Rau
Model: AK400
Location: CENER Sarriguren